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Material Science & Nanotechnology
All Products of Deposition Techniques
Spin Coater SPIN200i-NPP
200mm Single Substrate Spin Processor
Spin Coater POLOS200 Advanced
POLOS Advanced 200 are suitable for processing fragments of Ø 200 mm / 8 inch wafers (or Ø 260 mm substrates), or 6"x6" square substrates.
Spin Coater POLOS300 Advanced
The POLOS Advanced 300 spin coater is suitable for processing fragments of Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates.
PECVD Systems NPE-4000
NANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate...
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TableTop PA-MOCVD Systems NMC-3000
NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is use...
Sputtering System NSC-4000
Sputter Coater with auto load/unload sputter-up configuration
Benchtop Inkjet Printer PiXDRO LP50
The PiXDRO LP50 is designed for research and development of inkjet processes and applications
Thermal Evaporation Systems NTE-3000
Nano-Master Thermal Evaporation Technology
Atomic Layer Deposition Systems NLD-4000
High Uniformity (< 1Å ) Thin Film Deposition Technique
Electron Beam Evaporation System NEE-4000
NANO-MASTER offers combinatorial evaporation system using substrate masking and computer controlled evaporation rates for individual e-beam evaporators
WideTrack Ultrasonic Coating System
Wide Area Ultrasonic Spraying System
ExactaCoat Ultrasonic Coating System
Precision Laboratory Coating Machine
SAL1000 Atomic Layer Deposition Equipment
An affordable ALD equipment that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
SAL3000 Atomic Layer Deposition Equipment
A space saving ALD equipment with substantial functions that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
SEV2000Plus Vapor Deposition Equipment
Small evaporation system for R&D, for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.
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