The POLOS SPIN200i is a versatile and high-quality substrate spin coater. It is specifically designed for R&D and low volume production. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or PTFE construction ensures a metal-free, contamination-free process area that is easy to clean. Desktop version for manual or automated (optional) chemical dispense.
Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes
Features:
Easy, step- by- step recipe programming via large color touchscreen
Transparent Lid with syringe holder for central dispensing
Electro-magnetic safety lid lock
N2 diffuser for N2 purge during process
High Acceleration and Accuracy
Manual Chemical Dispense
CW & CCW Rotation
(Detachable) Color Touchscreen with Customizable Icons
Unlimited Program Storage for recipes with multiple steps each