Spin Coater SPIN150i

Our high - quality, all NPP POLOS single wafer spin coaters are specifically designed for R&D and low volume production in the MEMS, Semiconductor, PV, Microfluidics field, etc. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching.

The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel. Unlimited Program Storage for recipes with multiple steps each (CW & CCW rotation for puddle spin coating applications.)

• Spin processor for cleaning, drying, coating, developing and/or etching of up to Ø 160 mm substrates
• Full-Plastic System in Natural Polypropylene (NPP)
• Table-Top Model for manual or automated (optional) chemical dispense
• Transparent Lid with syringe holder for central dispensing
• Electro-magnetic safety lid lock
• Detachable controller interface for easy integration
• N2 diffuser for N2 purge during process.
• Easy, step- by- step recipe programming via large colour touchscreen.
• Unlimited Program Storage for recipes with multiple steps / each for:
  • Time 0.1-99999 sec/step
  • Speed 0-12,000 rpm **
  • Rotation direction (CW, CCW, puddling)
  • Acceleration /Deceleration 1-30,000 rpm/sec.**,selectable per step
  • Vacuum On /Off
• 3 Programmable Dry Contacts: e.g. for automated control of Dispense unit, Nitrogen diffuser, etc.
• Structured and password protected recipe storage for easy and safe management
• Digitally controlled Motor with digital incremental speed signal feed back
• Includes: (1) standard Vacuum Chuck
  • A-V36-S45-PP, Ø45 mm for up to Ø 6“ wafers D-V10-S50-PP, Small Fragment Adapter for Ø ½“- Ø 2’’ Pieces and Fragments (Alternative Chucks optionally available)
• Drain connection 1” male NPT
  • (Exhaust Hose optional)