Material Science & Nanotechnology

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SEV2000Plus Vapor Deposition Equipment

Small evaporation system for R&D, for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.

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Space saving system
Deposition of substrates up to Ø 100mm
Deposition of various size of substrate is possible with special trays
Easy setting of the substrate tray by a front hatch and automated chucking mechanism
Expandable with Sputter, ALD and Anneal Systems of Plus series.

Specification :

Equipment Dimensions (W x D x H)	2450 x 1050 x 1840 mm
Vapor Deposition Sources	Electron gun, Resistance heating
Operation	Touch screen electron manual
Combination	?

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