Park NX-IR R300 The Nanoscale Infrared Spectro-Microscopy System

Park NX-IR R300 is a nanoscale infrared spectroscopy system for up to 300 mm semiconductor wafers. It provides chemical property information as well as mechanical and topographical data for semiconductor research, failure analysis and defect characterization at an unprecedent high nano-resolution.

Park NX-IR R300 integrates the most advanced nanoscale IR spectroscopy with atomic force microscopy. It combines the photo-induced force microscopy (PiFM) module from Molecular Vista onto the industry leading Park NX20 300 mm AFM platform.

Park NX-IR R300 is both a spectroscopy and a microscopy system. The spectroscopy part of Park NX-IR R300 provides chemical identification under 10 nm spatial resolution. It uses a non-contact technique offering
damage-free spectroscopy scanning and the best in industry spatial resolution. The microscopy part of Park NX-IR R300 provides 3D topography with sub-angstrom height accuracy and material imaging in nanometer lateral resolution.