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Material Science & Nanotechnology
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Material Science & Nanotechnology
Material Characterisation
Thin Film Measurement
Non-contact Sheet Resistance Sensor EddyCus TF Inline
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Thin Film Measurement
Non-contact Sheet Resistance Sensor EddyCus TF Inline
Non-contact sheet resistance and layer thickness measurement solutions for process control
Pricing & Availability
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Brand:
Suragus
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Warranty Details
Overview
Specification
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Advantages
Non-contact real time measurement
High measurement speed up to 1,000 measurements/ sec.
Fixed sensor installation or traversing sensor installation
Integration of 1 – 99 monitoring lanes per system
Process control at atmosphere or in vacuum
Measurements very close to the edge of the substrate are possible in many applications
Long term stability by temperature compensated measurements in changing environment
Large distances to the testing material (eg. gap of 60 mm / 2.4 inch)
Characterization of covered conductive layers or encapsulated substrates
Numerous software integrated analysis and statistic functions
Easy set up by EddyCus RampUp software incl. wizard for system calibration
Wear- free
Measurement applications
Sheet resistance measurement of 0.1 mOhm/sq up to 1 kOhm/sq
Determination of the layer thickness of metal layers from 2 nm – 2 mm
Layer thickness measurement of metal foils
Measurement of the residual moisture in wet layers by non-contact permittivity measurement
Processes
Deposition (PVD, ALD, (PE)CVD, electroplating, printing, spraying etc.)
Ablation/ structuring (etching, polishing, laser etc.)
Doping/ Implantation
Tempering/ AnnealingDrying/ Heating
Applications
Architectural glass (LowE layers)
Packaging materials
Displays and touch screens
Photovoltaics
Mirror coatings
Capacitors
OLEDs and LEDs
Smart glass
Metal layers and wafer metallization
De-icing and heating
Batteries and fuel cells
Coated paper and conductive textiles
Graphene layers
Antibacterial coatings
Motivation for the use of inline metrology
Process optimization/ control for fast and homogeny deposition
Efficient layer stack according to the functionality (e.g. high transparency and low resistivity, good emissivity, good barrier properties)
Increasing of the layer homogeneity especially on large substrates
Optimization of the processing time and machine utilization
Optimization of material input / usage (sputter target)
Planning of maintenance cycles („predictive maintenance“)
Quality assurance
Additional Options
Standardized and customized measurement bridges
Determination of electrical anisotropy
Hardware trigger 5/12/24 V or 4-20 mA
Integrated temperature measurement
Integrated optical sensors for the determination of the optical transparency/ density (OEM)
Integrated distance measurement by ultrasound, laser triangulation or capacitive sensors (OEM)
Setups
Traversing sensor vs. fixed sensor installation
At atmosphere or in vacuum (ex-vacuo/ in-vacuo)
Specification :
Sheet resistance and metal film thickness measurement technology
Non-contact eddy current sensor
Substrates
e.g. foils, glass, wafer
Measurement gap size
1 / 5 / 10 / 15 / 25 / 50 mm (other on request)
Number of sensor pairs/monitoring lanes
1 – 99
Substrate thickness measurement for non-conductive substrates
Ultrasonic, capacitive or optical sensor on request
Conductive layers
Metals/TCOs/CNTs/nanowires/graphene/grids/other
Sheet resistance range covered by every sensor
0.0001 – 10 Ohm/sq < 2 % accuracy
10 – 100 Ohm/sq < 3 % accuracy
100 – 1.000 Ohm/sq < 5 % accuracy
Environment
< 60°C/ 140°F (on request < 90°C/ 194°F)
Sample rate
1 / 10 /50 /100 /1,000 measurement per second
Thickness measurement of metal films (e.g. Al, Ag, Mo, Ag paste)
2 nm – 2 mm (in accordance with sheet resistance)
Other integrated measurements
Metal thickness / optical transparency /densitiy / electrical anisotropy
Other integrated available features
Hardware trigger / DMC or bar code reader
GSM_Suragus_EddyCusTF_Inline_Catalogue1.pdf
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