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Material Science & Nanotechnology
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Microelectronics Solutions
Plasma Cleaner
CUTE Plasma System
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Plasma Cleaner
CUTE Plasma System
Plasma Surface Treatment System CUTE
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Brand:
Femto Science
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Process Chamber
Plasma Mode : PE (Plasma Etching) Mode with single electrode
Size : 140×200×110 (W×D×H, mm)
Single Block Aluminum (Not welded, Minimized gas leak)
Uniform gas flow design (Patent No. 10-1697205)
Generator
Frequency : 20~100kHz (10kHz increment)
Power: Max. 100W (Adjustable in 1W increment)
Automatic Impedance Matching
Process Monitoring and Control
Gas flow module
Maximum Number of gas channels : ×3 lines
Gas flow control : High repeatability MFC
Purge line : ×1 ea
Vent line : ×1 ea
MFC Flow rate : Max.100 sccm (1 sccm increment)
Controller
DSP on board signal controller
Automatic / Manual operation
Interactive integrated software
7” Touchscreen PC & USB data transfer
Saving and loading of process recipes
Process graphs and alarm log loading
Specification :
Process Mode
PE
Chamber
W.140 x D.200 x H.110 (mm)
Generator
20~100kHz Max. 100W
MFC
Max. 100 sccm
Gauge Pressure
Atm ~ 5 x 10-4 Torr
Operation
Manual & Automatic
Geometry
W.440 x D.500 x H.560 (mm)
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1 year against manufacturing defects only.
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