The EP4, our latest generation of imaging ellipsometers, combines ellipsometry and microscopy. This enables the characterization of thickness and refractive index with the sensitivity of ellipsometry on micro-structures as small as 1 µm.
The microscopic part of the EP4 enables an ellipsometric-enhanced contrast for microscopic images obtained. Minor changes in refractive index or thickness can be seen in the live view of the camera. This allows to identify regions of interest for the ellipsometric measurements to obtain values for thickness (0.1 nm - 10 µm) and refractive index. 3D maps of the lateral variation of thickness and/or refractive index can be recorded within a single measurement.
Modular setup: Easy upgrades between different configurations from BAM, single wave-, multiwave- to full spectroscopic ellipsometer
Spectroscopic imaging ellipsometry from 190/250/360 nm to 1000/1700/2700 nm
Highest lateral ellipsometric resolution of 1 µm, allowing to determine thickness and refractive index on microstructures as small as 1 µm
Ellipsometric enhanced contrast images for a live visualization of the sample
First identify, then measure: Intuitive selection of measurement region by drawing region in live view
Parallel measurement of multiple regions within the selected field of view
Patented knife-edge illumination for the non-destructive suppression of disturbing backside-reflections
Enlarge your measurement possibilities by using additional accessories, e.g. cells, temperature control or liquid handling
Quality Control:Also available as OEM version for QC in product lines