Deposition Techniques - Nanomaster Inc

PECVD Systems NPE-4000

PECVD Systems NPE-4000

NANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate...
TableTop PA-MOCVD Systems NMC-3000

TableTop PA-MOCVD Systems NMC-3000

NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is use...
Sputtering System NSC-4000

Sputtering System NSC-4000

Sputter Coater with auto load/unload sputter-up configuration
Electron Beam Evaporation System NEE-4000

Electron Beam Evaporation System NEE-4000

NANO-MASTER offers combinatorial evaporation system using substrate masking and computer controlled evaporation rates for individual e-beam evaporators
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