All Products of Deposition Techniques

Electron Beam Evaporation System NEE-4000

Electron Beam Evaporation System NEE-4000

NANO-MASTER offers combinatorial evaporation system using substrate masking and computer controlled evaporation rates for individual e-beam evaporators
Advanced Industrial Inkjet Printer PiXDRO IP410

Advanced Industrial Inkjet Printer PiXDRO IP410

The PiXDRO IP410 is the most advanced industrial inkjet printer for functional printing applications.
Benchtop Inkjet Printer PiXDRO LP50

Benchtop Inkjet Printer PiXDRO LP50

The PiXDRO LP50 is designed for research and development of inkjet processes and applications
TableTop PA-MOCVD Systems NMC-3000

TableTop PA-MOCVD Systems NMC-3000

NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is use...
PECVD Systems NPE-4000

PECVD Systems NPE-4000

NANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate...
Spin Coater POLOS300 Advanced

Spin Coater POLOS300 Advanced

The POLOS Advanced 300 spin coater is suitable for processing fragments of Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates.
Spin Coater POLOS200 Advanced

Spin Coater POLOS200 Advanced

POLOS Advanced 200 are suitable for processing fragments of Ø 200 mm / 8 inch wafers (or Ø 260 mm substrates), or 6"x6" square substrates.
Page 1 of 1 (14 products)