All Products of Deposition Techniques

Spin Coater POLOS200 Advanced

Spin Coater POLOS200 Advanced

POLOS Advanced 200 are suitable for processing fragments of Ø 200 mm / 8 inch wafers (or Ø 260 mm substrates), or 6"x6" square substrates.
Spin Coater POLOS300 Advanced

Spin Coater POLOS300 Advanced

The POLOS Advanced 300 spin coater is suitable for processing fragments of Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates.
PECVD Systems NPE-4000

PECVD Systems NPE-4000

NANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate...
TableTop PA-MOCVD Systems NMC-3000

TableTop PA-MOCVD Systems NMC-3000

NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is use...
Sputtering System NSC-4000

Sputtering System NSC-4000

Sputter Coater with auto load/unload sputter-up configuration
Benchtop Inkjet Printer PiXDRO LP50

Benchtop Inkjet Printer PiXDRO LP50

The PiXDRO LP50 is designed for research and development of inkjet processes and applications
Electron Beam Evaporation System NEE-4000

Electron Beam Evaporation System NEE-4000

NANO-MASTER offers combinatorial evaporation system using substrate masking and computer controlled evaporation rates for individual e-beam evaporators
SAL1000 Atomic Layer Deposition Equipment

SAL1000 Atomic Layer Deposition Equipment

An affordable ALD equipment that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
SAL3000 Atomic Layer Deposition Equipment

SAL3000 Atomic Layer Deposition Equipment

A space saving ALD equipment with substantial functions that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
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